CVD Equipment Co. (NASDAQ:CVV) reached a new 52-week low during mid-day trading on Friday . The stock traded as low as $3.89 and last traded at $3.87, with a volume of 19476 shares. The stock had previously closed at $4.02.
CVV has been the topic of several research analyst reports. TheStreet cut CVD Equipment from a “c-” rating to a “d” rating in a report on Monday, November 19th. ValuEngine upgraded CVD Equipment from a “sell” rating to a “hold” rating in a report on Wednesday, September 12th.
The company has a debt-to-equity ratio of 0.32, a quick ratio of 4.04 and a current ratio of 4.60.
Institutional investors have recently modified their holdings of the company. Commonwealth Equity Services LLC boosted its holdings in shares of CVD Equipment by 154.2% during the 2nd quarter. Commonwealth Equity Services LLC now owns 32,478 shares of the industrial products company’s stock worth $216,000 after purchasing an additional 19,700 shares during the last quarter. Wynnefield Capital Inc. boosted its holdings in shares of CVD Equipment by 7.4% during the 2nd quarter. Wynnefield Capital Inc. now owns 144,794 shares of the industrial products company’s stock worth $964,000 after purchasing an additional 10,000 shares during the last quarter. Finally, BB&T Securities LLC acquired a new position in shares of CVD Equipment during the 2nd quarter worth approximately $132,000. Institutional investors and hedge funds own 21.63% of the company’s stock.
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About CVD Equipment (NASDAQ:CVV)
CVD Equipment Corporation develops, manufactures, and sells equipment and process solutions used to develop and manufacture materials and coatings for research and industrial applications in the United States and internationally. It operates through two segments, CVD/First Nano and SDC. The company offers chemical vapor deposition systems for use in the research, development, and manufacture of aerospace and medical components, semiconductors, LEDs, carbon nanotubes, nanowires, solar cells, and other industrial applications; and rapid thermal processing systems for use in implant activation, oxidation, silicide formation, and other processes.
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